Imec has taken delivery of the ASML EXE:5200 High Numerical Aperture (High NA) EUV lithography system, the most advanced tool of its kind currently available.

The installation marks a significant step in the research centre’s efforts to support the semiconductor industry’s transition into the ångström era and accelerate progress towards sub-2nm chip technologies.

The new system has been integrated into Imec’s 300mm cleanroom in Leuven, Belgium, alongside a full suite of patterning, metrology and materials tools. According to Imec, this configuration will allow its global network of partners to experiment with next-generation scaling technologies required for advanced AI and high-performance computing.

Imec CEO Luc Van den hove said the delivery builds on two years of collaboration between Imec, ASML and industry partners through their joint High NA EUV Lithography Lab in Veldhoven, the Netherlands.

“With the installation of the EXE:5200 High NA EUV lithography system into our 300mm cleanroom in Leuven, we aim to bring these High NA EUV patterning technologies to an industry-relevant scale and to develop the next-generation High NA EUV patterning use cases,” he said.

He added that High NA EUV offers unmatched resolution, improved overlay performance and higher throughput, features expected to accelerate development of future logic and memory devices.

“As the industry moves into the ångström era, High NA EUV will be a cornerstone capability, and imec is proud to lead the way by offering its partners the earliest and most comprehensive access to this technology.”

The installation forms part of a five-year strategic partnership with ASML, backed by the EU Chips Joint Undertaking, IPCEI, as well as support from the Flemish and Dutch governments. Van den hove said the tool will be central to Europe’s ambitions in semiconductor research.

“As an integral part of the EU-funded NanoIC pilot line, the tool is set to play a pivotal role in strengthening Europe’s position as a leader in advanced semiconductor R&D in the decades to come,” he noted.

With the EXE:5200 now in place, Imec maintains one of the world’s most comprehensive environments for advanced patterning R&D. Its collaborations with chipmakers, equipment manufacturers, materials suppliers, mask specialists and metrology experts will support faster learning cycles and greater process stability. The centre expects this to drive breakthroughs in next-generation logic and high-density memory technologies.

ASML CEO Christophe Fouquet described the installation as a milestone for the sector.

“Imec’s installation of the EXE:5200 marks an important step into the ångström era. Together, we’re accelerating High NA EUV extendibility for the next generations of advanced memory and compute,” he said.

Imec expects the EXE:5200 system to be fully qualified by the fourth quarter of 2026. Until then, the joint ASML-Imec High NA EUV Lithography Lab in Veldhoven will continue supporting research work to ensure uninterrupted progress.

By: DocMemory
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